Method of Manufacturing a Semiconductor Device with a Carrier Having a Cavity and Semiconductor Device

ABSTRACT

A method includes providing a carrier having a first cavity, providing a dielectric foil with a metal layer attached to the dielectric foil, placing a first semiconductor chip in the first cavity of the carrier, and applying the dielectric foil to the carrier.

TECHNICAL FIELD

This invention relates to a method of manufacturing a semiconductordevice with a carrier having a cavity and a semiconductor device.

BACKGROUND

Semiconductor device manufacturers are constantly striving to increasethe performance of their products, while decreasing their cost ofmanufacture. A cost intensive area in the manufacture of semiconductordevices is packaging the semiconductor chips. As those skilled in theart are aware, integrated circuits are fabricated in wafers, which arethen singulated to produce semiconductor chips. One or moresemiconductor chips are placed in a package to protect them fromenvironmental and physical stresses. Packaging semiconductor chipsincreases the cost and complexity of manufacturing semiconductor devicesbecause the packaging designs not only provide protection, they alsopermit transmission of electrical signals to and from the semiconductorchips and, in particular, removal of heat generated by the semiconductorchips.

For these and other reasons there is a need for the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of embodiments and are incorporated in and constitute apart of this specification. The drawings illustrate embodiments andtogether with the description serve to explain principles ofembodiments. Other embodiments and many of the intended advantages ofembodiments will be readily appreciated as they become better understoodby reference to the following detailed description. The elements of thedrawings are not necessarily to scale relative to each other. Likereference numerals designate corresponding similar parts.

FIGS. 1A-1D schematically illustrate a cross-sectional view of oneembodiment of a method of manufacturing a device including providing acarrier having a cavity, placing a semiconductor chip in the cavity, andapplying a dielectric foil to the carrier;

FIG. 2 schematically illustrates a cross-sectional view of oneembodiment of a device including a semiconductor chip mounted on acarrier with a cavity formed in the carrier having a re-entrant angle;

FIGS. 3A-3H schematically illustrate a cross-sectional view of oneembodiment of a method of manufacturing a device including providing acarrier having a plurality of cavities, placing a plurality ofsemiconductor chip in the cavities, applying a dielectric foil to thecarrier, and singulating the carrier;

FIGS. 4A-4C schematically illustrate a cross-sectional view of avariation of the method illustrated in FIGS. 3A-3H;

FIGS. 5A-5D schematically illustrate a cross-sectional view of oneembodiment of a method of manufacturing a carrier having undercutcavities;

FIGS. 6A-6E schematically illustrate a cross-sectional view of a furthervariation of the method illustrated in FIGS. 3A-3H; and

FIG. 7 schematically illustrates a cross-sectional view of oneembodiment of a system including a device mounted on a circuit board.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

In the following detailed description, reference is made to theaccompanying drawings, which form a part hereof, and in which is shownby way of illustration specific embodiments in which the invention maybe practiced. In this regard, directional terminology, such as “top,”“bottom,” “front,” “back,” “leading,” “trailing,” etc., is used withreference to the orientation of the figure(s) being described. Becausecomponents of embodiments can be positioned in a number of differentorientations, the directional terminology is used for purposes ofillustration and is in no way limiting. It is to be understood thatother embodiments may be utilized and structural or logical changes maybe made without departing from the scope of the present invention. Thefollowing detailed description, therefore, is not to be taken in alimiting sense, and the scope of the present invention is defined by theappended claims.

It is to be understood that the features of the various exemplaryembodiments described herein may be combined with each other, unlessspecifically noted otherwise.

As employed in this specification, the terms “coupled” and/or“electrically coupled” are not meant to mean that the elements must bedirectly coupled together; intervening elements may be provided betweenthe “coupled” or “electrically coupled” elements.

Devices containing one or more semiconductor chips are described below.The semiconductor chips may be of different types, may be manufacturedby different technologies and may include, for example, integratedelectrical, electro-optical or electro-mechanical circuits and/orpassives. The semiconductor chips may, for example, be configured aspower semiconductor chips, such as power MOSFETs (Metal OxideSemiconductor Field Effect Transistors), IGBTs (Insulated Gate BipolarTransistors), JFETs (Junction Gate Field Effect Transistors), powerbipolar transistors or power diodes. Furthermore, the semiconductorchips may include control circuits, microprocessors ormicroelectromechanical components. In particular, semiconductor chipshaving a vertical structure may be involved, that is to say that thesemiconductor chips may be fabricated in such a way that electriccurrents can flow in a direction perpendicular to the main faces of thesemiconductor chips. A semiconductor chip having a vertical structuremay have contact elements, in particular, on its two main surfaces, thatis to say on its top side and bottom side. In particular, powersemiconductor chips may have a vertical structure. By way of example,the source electrode and gate electrode of a power MOSFET may besituated on one main surface, while the drain electrode of the powerMOSFET is arranged on the other main surface. Furthermore, the devicesdescribed below may include integrated circuits to control theintegrated circuits of other semiconductor chips, for example, theintegrated circuits of power semiconductor chips. The semiconductorchips need not be manufactured from specific semiconductor material, forexample, Si, SiC, SiGe, GaAs, GaN, and, furthermore, may containinorganic and/or organic materials that are not semiconductors, such as,for example, insulators, plastics or metals.

The semiconductor chips may have electrodes (or contact elements orcontact pads) which allow electrical contact to be made with theintegrated circuits included in the semiconductor chips. One or moremetal layers may be applied to the electrodes of the semiconductorchips. The metal layers may be manufactured with any desired geometricshape and any desired material composition. The metal layers may, forexample, be in the form of a layer covering an area. Any desired metalor metal alloy, for example, from aluminum, titanium, gold, silver,copper, palladium, platinum, nickel, chromium or nickel vanadium, may beused as the material. The metal layers need not be homogenous ormanufactured from just one material, that is to say various compositionsand concentrations of the materials contained in the metal layers arepossible.

The semiconductor chips may be placed on carriers. The carriers may beof any shape, size or material. According to one embodiment, thecarriers may be electrically conductive. They may be fabricated frommetals or metal alloys, in particular, copper, copper alloys, ironnickel, aluminum, aluminum alloys, or other appropriate materials.According to one embodiment, the carriers may be entirely made of ametal or a metal alloy. The carriers may be metal plates or metal foils.The carriers may be unstructured or structured and may be, for example,a leadframe or a part of a leadframe. Furthermore, the carriers may beplated with an electrically conductive material, for example, copper,silver, iron nickel or nickel phosphorus.

The carriers may have one or more cavities (or depressions or recesses).The cavities may be formed in the carrier by etching, mechanicalprocessing or any other appropriate technique. The cavities may have anyshape and size. The cavities may have at least one base surface on whicha semiconductor chip can be placed. This base surface may be essentiallycoplanar with one or both main surfaces of the carrier. The side wallsof the cavities may be essentially orthogonal to the main surfaces ofthe carrier or, alternatively, may form any other angle. In particular,the angle formed by at least one side wall of the cavity and the mainsurface of the carrier in which the cavity is formed may be smaller than90° and, in particular, may be in the range between 60° and 85°. Themain surface of the carrier, in which the cavity is formed, may overlapportions of the base surface of the cavity such that the cavity forms anundercut cavity.

The devices may include a dielectric layer. The dielectric layer maycover any fraction of any number of surfaces of the components of thedevice. The dielectric layer may serve various functions. It may beused, for example, to electrically insulate components of the devicefrom each other and/or from external components, but the dielectriclayer may also be used as a platform to mount other components, forexample, wiring layers. The dielectric layer may be used to producefan-out type packages. In a fan-out type package at least some of theexternal contact elements and/or conductor tracks connecting thesemiconductor chip to the external contact elements are locatedlaterally outside of the outline of the semiconductor chip or do atleast intersect the outline of the semiconductor chip. Thus, in fan-outtype packages, a peripherally outer part of the package of thesemiconductor chip is typically (additionally) used for electricallybonding the package to external applications, such as application boardsand others. This outer part of the package encompassing thesemiconductor chip effectively enlarges the contact area of the packagein relation to the footprint of the semiconductor chip, thus leading torelaxed constraints in view of package pad size and pitch with regard tolater processing, e.g., second level assembly.

The dielectric layer may, for example, be provided as a dielectric foil(or dielectric sheet) and may be laminated on the components of thedevice. The dielectric foil may be made of a polymer, such as epoxide,acrylate or a thermoplastic or thermosetting material. According to oneembodiment, the dielectric foil may, for example, be made of a filled orunfilled prepreg (short for preimpregnated fibers) that is a combinationof a fiber mat, for example, glass or carbon fibers, and a resin, forexample, a duroplastic material. Prepreg materials are usually used tomanufacture PCBs (printed circuit boards). Well known prepreg materialsthat are used in PCB industry and that can be used here as thedielectric material are: FR-2, FR-3, FR-4, FR-5, FR-6, G-10, CEM-1,CEM-2, CEM-3, CEM-4 and CEM-5. Instead of lamination, the dielectricmaterial may also be deposited by printing or from a gas phase or asolution or by compression molding, injection molding, powder molding,potting, dispensing, jetting or any other appropriate method. Thedielectric material may, for example, be any appropriate thermoplasticor thermosetting material.

One or more metal layers may be attached to the dielectric layer. Themetal layers may, for example, be used to produce a redistributionlayer. The metal layers may be used as wiring layers to make electricalcontact with the semiconductor chips from outside the devices or to makeelectrical contact with other semiconductor chips and/or componentscontained in the devices. The metal layers may be manufactured with anydesired geometric shape and any desired material composition. The metallayers may, for example, be composed of conductor tracks, but may alsobe in the form of a layer covering an area. Any desired metals, forexample, copper, aluminum, nickel, palladium, silver, tin or gold, metalalloys or metal stacks may be used as the material. The metal layersneed not be homogenous or manufactured from just one material, that isto say various compositions and concentrations of the materialscontained in the metal layers are possible. The metal layer may beattached to the dielectric foil before the dielectric foil is applied tothe carrier. The metal layer and the dielectric foil may be provided asa resin-coated-copper (RCC) foil.

The devices described below include external contact elements, which maybe of any shape, size and material. The external contact elements may beaccessible from outside the device and may thus allow electrical contactto be made with the semiconductor chips from outside the device.Furthermore, the external contact elements may be thermally conductiveand may serve as heat sinks for dissipating the heat generated by thesemiconductor chips. The external contact elements may be composed ofany desired electrically conductive material. The external contactelements may include external contact pads. Solder material may bedeposited on the external contact pads.

FIGS. 1A-1D schematically illustrate a cross-sectional view of oneembodiment of a method of manufacturing a device 100, which isillustrated in FIG. 1D. As illustrated in FIG. 1A, a carrier 10 isprovided which includes a first cavity 11. Furthermore, a dielectricfoil 12 with a metal layer 13 attached to the dielectric foil 12 isprovided as illustrated in FIG. 1B. A first semiconductor chip 14 isplaced in the first cavity 11 of the carrier 10 as illustrated in FIG.1C. Then the dielectric foil 12 together with the metal layer 13 isapplied to the carrier 10 as illustrated in FIG. 1D.

FIG. 2 schematically illustrates a cross-sectional view of a device 200.The device 200 includes a metal carrier 10 with a cavity (or recess ordepression) 11 formed in a main surface 15 of the carrier 10. The cavity11 may form an undercut such that the main surface 15 of the carrier 10overlaps a portion 23 of a base surface 24 of the cavity 11. Accordingto one embodiment, an angle α that is formed between the main surface 15of the carrier 10 and a side wall 16 of the cavity 11 has a value in therange between 60° and 85°. A semiconductor chip 14 is placed on the basesurface 24 of the cavity 11. The semiconductor chip 14 includes a firstelectrode 22 on a first surface 17 of the semiconductor chip 14 and asecond electrode 18 on a second surface 19 of the semiconductor chip 14.The second surface 19 is located opposite to the first surface 17. Thesemiconductor chip 14 is placed in the cavity 11 such that its firstsurface 17 faces the carrier 10. A dielectric layer 12 is placed overthe carrier 10 and the semiconductor chip 14. External contact elements20 and 21 are placed over the dielectric layer 12. The external contactelement 20 is electrically coupled to the first electrode 22 of thesemiconductor chip 14, and the external contact element 21 iselectrically coupled to the second electrode 18 of the semiconductorchip 14.

FIGS. 3A-3H, collectively FIG. 3, schematically illustrate across-sectional view of one embodiment of a method of manufacturing adevice 300, which is illustrated in FIG. 3H. The method that isillustrated in FIGS. 3A-3H is an implementation of the methodillustrated in FIGS. 1A-1D. The details of the method that are describedbelow can therefore be likewise applied to the method of FIGS. 1A-1D.Similar or identical components of the devices 100 and 300 are denotedby the same reference numerals.

As illustrated in FIG. 3A, a carrier 10 is provided. The carrier 10 maybe a plate or a foil made of a rigid material, for example, a metal or ametal alloy, such as copper, aluminum, nickel, CuFeP, steel or stainlesssteel. The carrier 10 may be electrically conductive and may be aleadframe. Moreover, the carrier 10 may be plated with an electricallyconductive material, for example copper, silver, iron nickel or nickelphosphorus. The shape of the carrier 10 is not limited to any geometricshape, and the carrier 10 may have any appropriate size. The carrier 10may have a flat upper main surface 15. The thickness d₁ of the carrier10 (measured in a direction orthogonal to the main surface 15) may be inthe range from 100 μm to several millimeter.

A plurality of cavities (or recesses or depressions) 11 may be formed inthe carrier 10. Each of the cavities 11 may extend from the upper mainsurface 15 of the carrier 10 into the carrier 10. Although in theembodiment of FIG. 3, a first, a second and a third cavity 11 areillustrated, any number of cavities 11 may be formed in the carrier 10.Each of the cavities 11 has side walls 16 surrounding the respectivecavity 11 and a base surface 24. The base surfaces 24 may be essentiallyplanar surfaces and may be coplanar to the main surface 15 of thecarrier 10. The height d₂ of the cavities 11 may be in the range from 5to 400 μm and, in particular, in the range from 40 to 100 μm. The heightd₂ may be the distance between the main surface 15 of the carrier 10 andthe base surface 24 of the cavity 11 measured in a direction orthogonalto the main surface 15. The height d₂ may be in the range of d₁/2. Thecavities 11 may be formed in the carrier 10 by pressing, punching,stamping, sawing, cutting, milling, etching or other appropriatetechniques.

A plurality of semiconductor chips 14 may be placed in the cavities 11as illustrated in FIG. 3B. Although in the embodiment of FIG. 3B afirst, a second and a third semiconductor chip 14 are illustrated, anynumber of the semiconductor chips 14 may be placed in the cavities 11 ofthe carrier 10. The semiconductor chips 14 are relocated on the carrier10 in larger spacing as they have been in the wafer bond. Thesemiconductor chips 14 may have been manufactured on the samesemiconductor wafer, but may alternatively have been manufactured ondifferent wafers. Furthermore, the semiconductor chips 14 may bephysically identical, but may also contain different integrated circuitsand/or represent other components and/or may have different outerdimensions and/or geometries. The semiconductor chips 14 may have athickness d₃ in the range between 40 μm and several hundred micrometers,in particular, in the range between 50 and 100 μm. The semiconductorchips 14 may be placed over the base surfaces 24 of the cavities 11 withtheir first surfaces 17 facing the base surfaces 24 and their secondsurfaces 19 opposite to the first surfaces 17 facing away from the basesurfaces 24.

Each of the semiconductor chips 14 may have a first electrode 22 on thefirst surface 17 and a second electrode 18 on the second surface 19. Thefirst and second electrodes 22, 18 may be load electrodes. Furthermore,each of the semiconductor chips 14 may have a third electrode 31 on itssecond surface 19 functioning as a control electrode. The semiconductorchips 14 may be configured as vertical power semiconductor chips and mayinclude power diodes or power transistors, for example, power MOSFETs,IGBTs, JFETs or power bipolar transistors. In the case of a power MOSFETor a JFET, the first load electrode 22 is a drain electrode, the secondload electrode 18 is a source electrode, and the control electrode 31 isa gate electrode. In the case of an IGBT, the first load electrode 22 isa collector electrode, the second load electrode 18 is an emitterelectrode, and the control electrode 31 is a gate electrode. In the caseof a power bipolar transistor, the first load electrode 22 is acollector electrode, the second load electrode 18 is an emitterelectrode, and the control electrode 31 is a base electrode. In case ofa power diode, the first and second load electrodes 22 and 18 arecathode and anode, respectively. During operation, voltages of up to 5,50, 100, 500 or 1000 V or even higher may be applied between the loadelectrodes 16 and 18. The switching frequency applied to the controlelectrode 31 may be in the range from 1 kHz to several GHz.

The first electrodes 22 of the semiconductor chips 14 may be firmlyattached and electrically coupled to the metal carrier 10. For thispurpose, an electrically conductive material 32 may be used, which may,for example, be a solder material, an electrically conductive adhesiveor a paste containing metal particles. The electrical connections may,for example, be produced by diffusion soldering, soft soldering,adhesive bonding by means of an electrically conductive adhesive orsintering of (nano-) metal particles.

If diffusion soldering is used as a connecting technique, it is possibleto use solder materials 32 which lead to intermetallic phases after theend of the soldering operation at the interface between the carrier 10and the respective semiconductor chip 14 on account of interfacediffusion processes. In this process, the solder material 32 iscompletely transformed, i.e., it passes completely into theintermetallic phase. Furthermore, a soft soldering process may beperformed in order to attach the semiconductor chips 14 to the carrier10. If soft soldering is used as a connection technique, a layer of thesolder material 32 remains at the interface between the semiconductorchip 14 and the carrier 10. Solder materials 32 which may be used forthe soldering process include, for example, Sn, AuSn, AgSn, CuSn, AgIn,AuIn, CuIn, AuSi or Au.

If the semiconductor chips 14 are adhesively bonded to the carrier 10,it is possible to use electrically conductive adhesives 32 which may bebased on filled or unfilled polyimides, epoxy resins, acrylate resins,silicone resins or mixtures thereof and be enriched with gold, silver,nickel or copper in order to produce the electrical conductivity.

According to one embodiment, a paste containing (nano-) metal particlesis used for attaching the semiconductor chips 14 to the carrier 10. Themetal particles may, for example, be made of silver, gold, copper, tinor nickel. The extensions (average diameter) of the metal particles maybe smaller than 100 nm and, in particular, smaller than 50 nm or 10 nmor 5 nm. It may also be provided that only a fraction of the metalparticles has such dimensions. For example, at least 10% or 20% or 30%or 40% or 50% or 60% or 70% of the metal particles may have dimensionssmaller than 100 nm or 50 nm or 10 nm or 5 nm. The other metal particlesmay have larger dimensions. The metal particles may be coated with alayer of an organic material or a flux material, for example, colophony.Furthermore, the metal particles may be dispersed in a suitable liquidor solvent.

After the placement of the semiconductor chips 14 on the carrier 10, thepaste containing the metal particles may be exposed to a temperature T₁,which is high enough that the solvent and the layers coating the metalparticles sublimate or evaporate. Furthermore, the temperature T₁ may belower than the melting temperature of the metal of which the metalparticles are made, but the temperature T₁ may be high enough toinitiate a sintering process of the metal particles. After the solventand the coating layers are removed, the metal particles may thus form asolid layer 32 due to their sintering as illustrated in FIG. 3B. Thesinter layer 32 is electrically conductive. The temperature T₁ may be inthe range from 150 to 450° C., in particular in the range from 180 to300° C. and may depend on the material of the metal particles. Duringthe sinter process the semiconductor chips 14 may be pressed towards thecarrier 10.

After finishing the soldering, gluing or sintering process, the layer ofthe electrically conductive material 32 may have a thickness d₄ in therange between 1 and 40 μm. In the case of diffusion soldering, thethickness d₄ may be close to zero or even zero. The height d₂ of thecavities 11 may essentially be equal to the thickness d₃ of thesemiconductor chip 14 plus the thickness d₄ of the electricallyconductive material 32, i.e., d₂=d₃+d₄. Moreover, the height d₂ maydeviate from the sum of d₃ and d₄ for up to ±20 μm, i.e., d₃+d₄<20μm<d₂<d₃+d₄+20 μm, or, according to one embodiment, for up to ±10 μm,i.e., d₃+d₄−10 μm<d₂<d₃+d₄+10 μm or, according to one embodiment, for upto ±5 μm, i.e., d₃+d₄−5 μm<d₂<d₃+d₄+5 μm.

After the placement of the semiconductor chips 14 in the cavities 11,there may be gaps between the side surfaces of the semiconductor chips14 and the respective side walls 16 of the cavities 11. The widths d₅ ofthese gaps may be in the range from 20 to 200 μm.

As illustrated in FIG. 3C, a dielectric foil (or sheet) 12 may beprovided with a metal layer 13 attached to one surface of the dielectricfoil 12. The dielectric foil 12 may then be placed over the carrier 10and the semiconductor chips 14 with the metal layer 13 facing away fromthe carrier 10. The dielectric foil 12 may encapsulate the semiconductorchips 14 as illustrated in FIG. 3D. The dielectric foil 12 may belaminated on top of the carrier 10 as well as the semiconductor chips14. Heat and/or pressure may be applied for a time suitable to attachthe dielectric foil 12 to the underlying structure. For example, atemperature in the range between 100 and 200° C. and, in particular, inthe range between 140 and 160° C. may be used for the laminationprocess. The gaps between the semiconductor chips 14 and the respectiveside walls 16 of the cavities 11 may also filled with the dielectricfoil 12.

The dielectric foil 12 may be made of an electrically insulatingmaterial, for example, a polymer material, such as epoxide, acrylate ora thermoplastic or thermosetting material. According to one embodiment,the polymer material may be a prepreg material that is a combination ofa fiber mat, for example, glass or carbon fibers, and a resin, forexample a duroplastic material. Prepreg materials are usually used tomanufacture PCBs. Well known prepreg materials that are used in PCBindustry and that can be used here as the polymer material are: FR-2,FR-3, FR-4, FR-5, FR-6, G-10, CEM-1, CEM-2, CEM-3, CEM-4 and CEM-5.Prepreg materials are bi-stage materials, which are flexible whenapplied over the semiconductor chips 14 and hardened during aheat-treatment. For the lamination of the prepreg the same or similarprocess steps can be used as in PCB manufacturing. Furthermore, thedielectric layer 12 together with the metal layer 13 may be aresin-coated-copper (RCC) foil. The metal layer 13 may be made of anappropriate metal or metal alloy, such as copper or aluminum. Beforeattaching the dielectric foil 12 to the carrier 10 and the semiconductorchips 14, the dielectric foil 12 may have a thickness d₆ in the rangebetween 50 and 200 μm and, in particular, in the range from 80 to 120μm, but may also be outside these ranges. The thickness d₇ of the metallayer 13 may be in the range between 5 and 20 μm. After finishing thelamination process, the distance d₈ between the upper main surface 15 ofthe carrier 10 and the upper surface of the dielectric layer 12 (or thelower surface of the metal layer 13) may be in the range between 10 and50 μm.

Instead of lamination, the dielectric layer 12 may be deposited byprinting or from a gas phase or a solution or by compression molding,injection molding, powder molding, potting, dispensing, jetting or anyother appropriate method.

The dielectric layer 12 together with the metal layer 13 may bestructured as illustrated in FIG. 3E. A plurality of cutouts orthrough-holes 40 are created in the metal layer 13 and the dielectriclayer 12 to expose at least portions of the second electrodes 18 and thecontrol electrodes 31 of the semiconductor chips 14 as well as portionsof the upper main surface 15 of the carrier 10 so that electricalconnections can be made to those exposed regions. The metal layer 13 andthe dielectric layer 12 may be structured by applying an etching mask tothe upper surface of the metal layer 13 and subsequent wet chemicaletching of the portions of the metal layer 13 and the underlyingdielectric layer 12 that are exposed from the etching mask. Thereafterthe etching mask may be stripped off by using an appropriate solvent.Instead of chemical etching, laser ablation (laser drilling) may beemployed to produce the through-holes 40 in the metal layer 13 and thedielectric layer 12.

If the height d₂ of the cavities 11 is similar to the thickness d₃ ofthe semiconductor chips 14 plus the thickness d₄ of the layer of theelectrically conductive material 32, i.e. d₂˜d₃+d₄, all through-holes 40have about the same height. This makes it easier to produce thethrough-holes 40, in particular, if laser ablation is employed toproduce the through-holes 40. Moreover, it may be provided that allthrough-holes 40 have the same width (in a direction parallel to themain surface 15 of the carrier 10). This further simplifies theproduction of the through-holes 40, especially in case of laserablation.

The through-holes 40 may be filled with an electrically conductivematerial 41, for example, a metal or metal alloy, as illustrated in FIG.3F. The electrically conductive material 41 may, for example, bedeposited by a galvanic deposition process. Thereby the carrier 10 andthe electrodes 18, 31 may be used as electrodes for the electrochemicaldeposition of an appropriate metal or metal alloy, for example, copper.Furthermore, the through-holes 40 may be filled with a paste containingmetal particles. It may be sufficient to cover only the walls of thethrough-holes 40 with the electrically conductive material 41, howeverthe through-holes 40 may also be completely filled. The electricallyconductive material 41 produces an electrical coupling of the carrier 10and the electrodes 18, 31 to the metal layer 13.

As illustrated in FIG. 3G, the metal layer 13 may be structured in orderto produce the footprint of the devices 300. For this purpose, aphotostructurable resist film may be laminated on the top of the metallayer 13 and the upper surface of the electrically conductive material41. Recesses may be formed in the resist film by exposure to lighthaving a suitable wave-length. For that, a laser beam or light exposurethrough a mask may be employed. Subsequently, the resist film isdeveloped and the thereby exposed portions of the metal layer 13 areetched. Afterwards the resist film is stripped off, and the structuredmetal layer 13 remains on the dielectric layer 12 as illustrated in FIG.3G.

As illustrated in FIG. 3H, the devices 300 are separated from oneanother by separation of the carrier 10 and the dielectric layer 12.Singulation of the devices 300 may be carried out, for example, bysawing, cutting, milling, laser ablation or etching. In the devices 300the structured metal layer 13 and the electrically conductive material41 filling the through-holes 40 serve as a redistribution layer andforms external contact elements 20, 21 and 42, which are electricallycoupled to the first electrode 22 (via the electrically conductivecarrier 10), the second electrode 18 and the control electrode 31 of thesemiconductor chip 14, respectively. The upper surface of the metallayer 13 is a mounting surface which can be used to mount the device 300on another components, for example, a circuit board.

The devices 300 manufactured by the method described above are fan-outtype packages. The dielectric layer 12 allows the redistribution layerto extend beyond the outline of the semiconductor chip 14. The externalcontact elements 20, 21 and 42 therefore do not need to be arrangedwithin the outline of the semiconductor chip 14 but can be distributedover a larger area. The increased area which is available forarrangement of the external contact elements 20, 21 and 42 as a resultof the dielectric layer 12 means that the external contact elements 20,21 and 42 cannot only be arranged at a great distance from one another,but that the maximum number of external contact elements 20, 21 and 42which can be arranged there is likewise increased compared to thesituation when all the external contact elements 20, 21 and 42 arearranged within the outline of the semiconductor chip 14.

It is obvious to a person skilled in the art that the devices 300illustrated in FIG. 3H and the manufacturing thereof as described aboveare only intended to be an exemplary embodiment, and many variations arepossible. For example, further semiconductor chips or passives ofdifferent types may be included in the same device 300. Thesemiconductor chips and passives may differ in function, size,manufacturing technology etc.

According to one embodiment, the dielectric foil 12 may be laminatedover the carrier 10 and the semiconductor chips 14 without the metallayer 13 attached to the dielectric foil 12. The metal layer 13 may bedeposited over the dielectric foil 12 after the lamination process.

In the embodiment shown in FIGS. 3A-3H the side walls 16 of the cavities11 are essentially orthogonal to the upper main surface 15 of thecarrier 10. FIGS. 4A-4C schematically illustrate a cross-sectional viewof one embodiment of a method of manufacturing a device 400 where theside walls 16 of the cavities 11 in the metal carrier 10 are notorthogonal to the upper main surface 15 of the carrier 10. Instead, theside walls 16 of the cavities 11 are formed such that the main surface15 of the carrier 10 overlaps portions 23 of the base surface 24 of thecavities 11. In one embodiment, an angle α in the range between 60° and85° and, in particular, between 70° and 80° is formed between the mainsurface 15 of the carrier 10 and each of the side walls 16, whichsurround the respective cavity 11. Since the base surfaces 24 of thecavities 11 are essentially coplanar to the upper main surface 15 of thecarrier 10, each base surface 24 and each of the respective side walls16 also form the angle α. As illustrated in FIG. 4A, an angle β=360°−αis a re-entrant angle due to the arrangement of the side walls 16 andthe apex of the angle β faces into the carrier 10. All other parametersof the carrier 10 illustrated in FIG. 4A are identical to thecorresponding parameters of the carrier 10 illustrated in FIG. 3A. Thecavities 11 of the carrier 10 as illustrated in FIG. 4A may be producedby mechanical processing the carrier 10, for example, milling, cuttingor stamping.

Moreover, the manufacturing steps illustrated in FIGS. 3B-3G can beapplied to the carrier 10 of FIG. 4A, which leads to a workpiece asillustrated in FIG. 4B, where the semiconductor chips 14 are placed inthe cavities 11 and the dielectric foil 12 together with the metal layer13 is laminated onto the carrier 10 with subsequent structuring of thedielectric foil 12 and the metal layer 13 and filling the through-holes40 with the electrically conductive material 41.

Thereafter the semiconductor chips 14 are separated from one anotherthereby creating devices 400 as illustrated in FIG. 4C by separation ofthe carrier 10 and the dielectric layer 12. Singulation of the devices400 may be carried out, for example, by sawing, cutting, milling, laserablation or etching. The devices 400 may be identical to the devices 300with the exception of the different arrangement of the side walls 16.The undercut of the cavities 11 of the devices 400 may increase themechanical attachment of the dielectric layer 12 to the carrier 10. Thedevice 400 is an implementation of the device 200 illustrated in FIG. 2.

FIGS. 5A-5D schematically illustrate a cross-sectional view of oneembodiment of a method of manufacturing a carrier 10 similar to thecarrier 10 of FIG. 4A where the side walls 16 of the cavities 11 are notorthogonal to the upper main surface 15 of the carrier 10. Firstly ametal carrier 10 as illustrated in FIG. 5A is provided. In this state,the carrier 10 has an even main surface 15. Then an etching mask 50 isdeposited on the upper main surface 15 of the carrier 10 as illustratedin FIG. 5B. For this purpose, a resist film 50 may be laminated on themain surface 15 of the carrier 10, which is photostructurable. Recessesmay be formed in the resist film 50 by exposure to light having asuitable wave-length. For that, a laser beam or light exposure through amask may be employed. Subsequently, the resist film is developed. Theresist film 50 has then the shape as illustrated in FIG. 5B.

Subsequently, the upper main surface 15 of the carrier 10 may be exposedto an appropriate etching agent for a suitable time. Thereby theportions of the carrier 10 that are exposed from the etching mask 50 areetched and the cavities 11 are formed as illustrated in FIG. 5C. Due tothe etching process, the side walls 16 of the cavities 11 have a curvedsurface rather than a planar surface. The cavities 11 are formed suchthat the main surface 15 of the carrier 10 overlaps portions of the basesurface 24 of the cavities 11. Afterwards the resist film 50 is strippedoff, and the structured carrier 10 is obtained as illustrated in FIG.5D, which may be used to manufacture the devices 400 as illustrated inFIGS. 4A-4C.

A further variation of the fabrication method illustrated in FIGS. 3A-3His schematically illustrated in FIGS. 6A-6E. In FIG. 6A a metal carrier10 is illustrated in a plan view (top) and a cross-sectional view(bottom). The carrier 10 includes a plurality of cavities 11, the sidewalls 16 of which may have the shape of the embodiment illustrated inFIG. 3A or the embodiment illustrated in FIG. 4A. In each of thecavities 11 a semiconductor chip 14 may be placed as described above inconnection with FIG. 3B.

A first dielectric foil 12 with a metal layer 13 on top may be laminatedover the carrier 10 and the semiconductor chips 14. The samemanufacturing steps may be carried out as illustrated in FIGS. 3C-3G anddescribed above. The workpiece that is obtained from these manufacturingsteps is illustrated in FIG. 6B. The metal layer 13 is structured andprovides a first wiring layer (together with the through-holes 40 filledwith the electrically conductive material 41) which electrically couplesthe semiconductor chips 14 to each other.

Subsequently, a second dielectric foil 12 with a second metal layer 13on top may be laminated over the structured first dielectric foil 12 andthe first metal layer 13. The same manufacturing steps may be carriedout as illustrated in FIGS. 3C-3G and described above. The workpiecethat is obtained from these manufacturing steps is illustrated in FIG.6C. The structured second metal layer 13 provides a second wiring layerwhich electrically couples the semiconductor chips 14 with each other.

As illustrated in FIG. 6D, a third dielectric foil 12 with a third metallayer 13 on top may be laminated over the structured second dielectricfoil 12 and the second metal layer 13. The third dielectric foil 12 andthe third metal layer 13 may again be structured as described above toobtain external contact elements 51 on top of the workpiece. It may alsobe provided that further dielectric foils 12 and metal layers 13 arelaminated onto the workpiece.

As illustrated in FIG. 6E, the devices 600 are separated from oneanother by separation of the carrier 10, the dielectric layers 12 andthe metal layers 13. Singulation of the devices 600 may be carried out,for example, by sawing, cutting, milling, laser ablation or etching.Each of the devices 600 may contain a plurality of semiconductor chips14, which are electrically coupled to each other via the structuredmetal layers 13. For example, each of the devices 600 may include one ormore power semiconductor chips 14 and one or more logic chips 14. Thelogic chips 14 may be coupled to the power semiconductor chips 14, forexample, to their control electrodes 31, such that the logic chips 14can drive the power semiconductor chips 14.

FIG. 7 schematically illustrates a cross-sectional view of a system 700including the device 300 mounted on a circuit board 60, for example, aPCB. The circuit board 60 includes contact pads 61 to which the externalcontact elements 20, 21 and 42 of the device 300 are soldered usingsolder deposits 62. On top of the device 300, a heat sink may beattached. Instead of the device 300, one of the devices 100, 200, 400and 600 may be mounted on the circuit board 60.

In addition, while a particular feature or aspect of an embodiment ofthe invention may have been disclosed with respect to only one ofseveral implementations, such feature or aspect may be combined with oneor more other features or aspects of the other implementations as may bedesired and advantageous for any given or particular application.Furthermore, to the extent that the terms “include”, “have”, “with”, orother variants thereof are used in either the detailed description orthe claims, such terms are intended to be inclusive in a manner similarto the term “comprise”. Furthermore, it should be understood thatembodiments of the invention may be implemented in discrete circuits,partially integrated circuits or fully integrated circuits orprogramming means. Also, the term “exemplary” is merely meant as anexample, rather than the best or optimal. It is also to be appreciatedthat features and/or elements depicted herein are illustrated withparticular dimensions relative to one another for purposes of simplicityand ease of understanding, and that actual dimensions may differsubstantially from that illustrated herein.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat a variety of alternate and/or equivalent implementations may besubstituted for the specific embodiments shown and described withoutdeparting from the scope of the present invention. This application isintended to cover any adaptations or variations of the specificembodiments discussed herein. Therefore, it is intended that thisinvention be limited only by the claims and the equivalents thereof.

1. A method, comprising: providing a carrier having a first cavity;providing a dielectric foil with a metal layer attached to thedielectric foil; placing a first semiconductor chip in the first cavityof the carrier; and applying the dielectric foil to the carrier.
 2. Themethod of claim 1, wherein the carrier has a second cavity, the methodfurther comprising placing a second semiconductor chip in the secondcavity.
 3. The method of claim 2, wherein the first semiconductor chipis separated from the second semiconductor chip after applying thedielectric foil to the carrier.
 4. The method of claim 1, wherein thedielectric foil is laminated on the carrier.
 5. The method of claim 1,wherein the carrier is electrically conductive.
 6. The method of claim1, wherein the first semiconductor chip comprises a first electrode on afirst surface and a second electrode on a second surface opposite to thefirst surface, and the first semiconductor chip is placed in the firstcavity of the carrier with the first surface facing the carrier.
 7. Themethod of claim 1, wherein the metal layer faces away from the carrierwhen the dielectric foil is applied to the carrier.
 8. The method ofclaim 1, wherein the dielectric foil fills a gap between the carrier andthe first semiconductor chip.
 9. The method of claim 1, wherein thedielectric foil and the metal layer are structured to createthrough-holes in the dielectric foil and the metal layer in order toexpose at least portions of the first semiconductor chip.
 10. The methodof claim 9, wherein the through-holes in the dielectric foil and themetal layer are filled with at least one of a metal and a metal alloy.11. The method of claim 10, wherein the metal layer is structured afterthe through-holes are filled with at least one of a metal and a metalalloy.
 12. The method of claim 1, wherein external contact elements areproduced from the metal layer.
 13. The method of claim 12, wherein thefirst semiconductor chip comprises a first electrode on a first surfaceand a second electrode on a second surface opposite to the firstsurface, and the first semiconductor chip is placed in the first cavityof the carrier with the first surface facing the carrier, wherein thefirst and second electrode of the first semiconductor chip areelectrically coupled to the external contact elements.
 14. The method ofclaim 1, wherein the dielectric foil with the metal layer attached tothe dielectric foil is a resin-coated-copper (RCC) foil.
 15. The methodof claim 1, wherein the first semiconductor chip is attached to thecarrier by means of an electrically conductive material.
 16. The methodof claim 15, wherein the first semiconductor chip has a height d₃, theelectrically conductive material has a height d₄ after attachment of thefirst semiconductor chip to the carrier and the first cavity of thecarrier has a height d₂ where d₃+d₄−20 μm<d₂<d₃+d₄+20 μm.
 17. The methodof claim 1, wherein a further dielectric foil with a further metal layerattached to the further dielectric foil is applied to the dielectricfoil.
 18. The method of claim 1, wherein the first semiconductor chip isplaced on a base surface of the first cavity and a main surface of thecarrier overlaps portions of the base surface of the first cavity.
 19. Amethod, comprising: providing a carrier having a cavity; providing asemiconductor chip comprising a first electrode on a first surface and asecond electrode on a second surface opposite to the first surface;providing a resin-coated-copper foil; placing the semiconductor chip inthe cavity of the carrier with the first surface of the semiconductorchip facing the carrier; laminating the resin-coated-copper foil to thecarrier; and structuring the resin-coated-copper foil to obtain externalcontact elements.
 20. A method, comprising: providing a carrier having acavity; placing a semiconductor chip in the cavity of the carrier;laminating a dielectric foil over the carrier and the semiconductorchip; and applying a metal layer over the dielectric foil.
 21. A device,comprising: a metal carrier with a cavity formed in a main surface ofthe metal carrier, the main surface of the metal carrier overlappingportions of a base surface of the cavity; a semiconductor chipcomprising a first electrode on a first surface and a second electrodeon a second surface opposite to the first surface, the semiconductorchip disposed on the base surface of the cavity in the metal carrierwith its first surface facing the base surface; a dielectric layeroverlying the semiconductor chip and the carrier; and external contactelements overlying the dielectric layer and electrically coupled to thefirst and second electrode of the semiconductor chip.
 22. The device ofclaim 21, wherein an angle formed between the main surface of the metalcarrier and a side wall of the cavity has a value in the range between60° and 85°.
 23. A device, comprising: a metal carrier with a firstcavity formed in the metal carrier; a first semiconductor chipcomprising a first electrode on a first surface and a second electrodeon a second surface opposite to the first surface, the firstsemiconductor chip disposed in the first cavity of the metal carrierwith its first surface facing the metal carrier; a firstresin-coated-copper foil overlying the first semiconductor chip and themetal carrier; and a second resin-coated-copper foil overlying the firstresin-coated-copper foil.
 24. The device of claim 23, wherein the secondresin-coated-copper foil forms external contact elements electricallycoupled to the first and second electrodes of the first semiconductorchip.
 25. The device of claim 23, wherein a second semiconductor chip isdisposed in a second cavity formed in the metal carrier.